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High-Purity Silicon Consumable Parts for Semiconductor Dry Etching
Various high-purity silicon consumable parts are used in semiconductor dry etching processes, where components are directly exposed to plasma and process gases. Key products include Focus Rings, Electrodes/Cathodes, C-Shrouds, and various Silicon Rings and Plates, which play an important role in maintaining stable plasma conditions, gas flow, and etching uniformity.
Truly supplies precision-machined silicon parts for a wide range of semiconductor etching equipment, using high-purity Single Crystal and Polycrystalline Silicon materials.
Based on customer drawings and specific process requirements, we provide customized solutions in material properties, resistivity, dimensions, geometry, and surface conditions. Our integrated supply capability covers high-purity raw material supply, precision machining, cleaning, and finished component manufacturing.
Main Products
─Focus Ring / Silicon Ring
Key consumable components positioned around the wafer to help maintain stable plasma distribution and etching uniformity while protecting surrounding chamber components.
─Electrode / Cathode
Precision-machined components designed to support uniform process gas distribution and stable plasma generation. Various configurations, including Flat and Curved Electrodes, are available according to equipment and process requirements.
─C-Shroud / Other Silicon Parts
Large-diameter rings, C-Shrouds, plates, and other complex silicon components are precision-machined according to customer drawings and specifications.
Key Features
● High-Purity Single Crystal & Polycrystalline Silicon
● Low / Middle / High Resistivity Options● High-Precision Machining● Micro-Hole, Slot & Complex Profile Machining● Flat & Curved Electrode Capability● Excellent Plasma Compatibility● Customized Designs & Specifications● Integrated Material-to-Finished-Part Supply
Applications
Semiconductor Dry Etching / Plasma Etching Equipment